Generic Processes & Materials working group

Work Plan for 2011

Version 1.0

• Biasing
  • Enrich event biasing options
  • Review and unify existing biasing options
  • Systematic documents
    • Refresh existing documentation
    • Explicit or complete mathematical computations
    • Provide references
  • Minimal tools for statistics
    • Provide minimal statistics tools to monitor the validity of the simulation results
  • Process-based biasing
    • Prototype for (multi-)differential cross-section functionality
    • Also related to reverse MC
  
  
• Reverse MC
  • Maintenance
  • Prototype for (multi-)differential cross-section functionality (as above)


• Materials
  • As documented in section "2) Material category development" of EM group work plan
    • Introduce "base material" approach as a first step to variable density approach
    • Adding extra data on molecule levels
    • Review and upgrade of G4SandiaTable
    • Redesign the G4MaterialPropertyVector class interfaces for G4Scintillation and optical processes to employ spline interpolation to empirical input
  • Re-analysis of SystemOfUnits
    • Investigation at this point


• Generic processes
  • Finalize review for parallel geometries

Updated: 21st February 2011